甲基丙烯酸酯类光刻胶成膜树脂的合成与性能研究

Synthesis and properties of methylacrylate photoresist matrix resin

以甲基丙烯酸（MAA）、甲基丙烯酸甲酯（MMA）、丙烯酸丁酯（BA）为单体,偶氮二异丁腈为引发剂,采用溶液自由基聚合方法,合成了甲基丙烯酸酯类光刻胶成膜树脂,研究了合成工艺对产物分子量及分子量分布的影响,并对其在光刻胶中的应用性能,如碱溶性、涂膜表面干燥性、感度和分辨率等进行了初步考察。结果表明,在引发剂用量为单体用量的0.6%~1%、反应温度80~85℃、3次进料条件下,制得的聚合物的重均分子量为44 341~53 696,分子量分布为3.66~5.69,由单体质量比MAA∶MMA∶BA为25∶50∶25的成膜树脂配制的光刻胶,分辨率达35μm。

A methylacrylate photoresist matrix resin was synthesized by free radical solution polymerization with MAA,MMA and BA as monomers,AIBN as intiator.The effect of synthesis on molecular weight and molecular weight distribution was investigated,and a preliminary study on properties of photoresist was conducted,such as alkali-solubility,drying of film surface,sensitivity,resolution and so on.The results showed that the polymer molecular weight was 44 341～53 696,and the molecular weight distribution was 3.66～5.69,when the initiator concentration was 0.6%～1%,reaction temperature was 80～85 ℃,three times feeding.Resolution of photoresist prepared by matrix resin with the monomer ratio MAA ∶MMA ∶BA of 25 ∶50 ∶25 can reach the level of 35 μm.