期刊文献+
任意字段
题名或关键词
题名
关键词
文摘
作者
第一作者
机构
刊名
分类号
参考文献
作者简介
基金资助
栏目信息

直流弧光放电PCVD金刚石膜制备中基底控温系统的研制与应用 被引量：4

Design and Application of Substrate Temperature Control System in DC Arc Discharge PCVD Diamond Films Device
下载PDF
导出
摘要 基于直流弧光放电PCVD金刚石薄膜沉积设备的特点,设计开发了基底自动控温系统。将该系统应用于金刚石薄膜的制备中,并采用SEM、Raman光谱等测试方法对所制备的薄膜的形貌、品质进行了表征。结果证明该系统具有较好的稳定性,其应用时所制备的金刚石薄膜的品质明显得到提高,具有广泛的应用前景。 A temperature auto control system had been developed for a substrate holder apparatus on the basis of the DC arc discharge plasma CVD growth system.The CVD diamond films were deposited by DC arc discharge plasma using the novel technique above mentioned.The morphology and quality of diamond films were analyzed by scanning electron microscopy（SEM） and laser Raman spectroscopy.The results showed that the system is steady,the quality of diamond films is improved using substrate temperature control system,and has very broad applicable prospect
作者 张湘辉 汪灵 龙剑平
机构地区 成都理工大学材料与化学化工学院 成都理工大学金刚石薄膜实验室
出处 《人工晶体学报》 EI CAS CSCD 北大核心 2011年第1期75-82,共8页 Journal of Synthetic Crystals
基金 国家自然科学基金(50974025 40572030) 四川省科技厅重点科技攻关项目(05GG021-001) 四川省教育厅自然科学重点科研项目(2003A142) 四川省教育厅自然科学项目(07ZB009) 国家公益性行业科学专项经费课题(201011005-5)
关键词 直流弧光放电 等离子体CVD 金刚石薄膜 基底托架 温度自动控制 DC arc discharge plasma chemical vapor deposition diamond films substrate holder substrate temperature control
分类号 TP273 [自动化与计算机技术—检测技术与自动化装置]
  • 相关文献

参考文献24

  • 1May P W.Diamond Thin Films:a 21st-century Material[J].Phil.Trans.Roy.Soc.bond.4,2000,358:473-95.
  • 2Breiter M,Doppleb C,Wei K H,et al.Diamond Synthesis with a DC Plasma Jet:Control of the Substrate Temperature[J].Diamond and Related Materials,2000,9:333-336.
  • 3Tamor M A,Everson M P.On the Role of Penetration Twins in the Morphological Development of Vapor Grown Diamond Films[J].Journal of Materials Research,1994,9(7):1839-1848.
  • 4Snail K A.Substrate Temperature Control Apparatus and Technique for CVD Reactors[P].USA,5318801,1996.6.7.
  • 5Harris S J,Weiner A M.Pressure and Temperature Effects on the Kinetics and Quality of Diamond Films[J].Journal of Applied Physics,1994,75:5026-5032.
  • 6Bieberich M T,Girshick S L.Control of Substrate Temperature during Diamond Deposition[J].Plasma Chemistry and Plasma Processing,1996,16(1):157S-168S.
  • 7Goodwin D G.Scaling Laws for Diamond Chemical-vapor Deposition.Ⅱ.Atomic Hydrogen Transport[J].Journal of Applied Physics,1993,74(11):6895-6906.
  • 8Berghaus J O.Induction Plasma Deposition of Diamond Thin Films[D].McGill Univereity,Montreal,1996.
  • 9Owano T G,Kruger C H.Parametric Study of Atmospheric-pressure Diamond Synthesis with an Inductively Coupled Plasma Torch[J].Plasma Chemistry and Plasma Processing,1993,13(3):433-446.
  • 10Girshick S L,Li C,Yu B W,et al.Fluid Boundary Layer Effects in Atmospheric-pressure Plasma Diamond Film Deposition[J].Plasma Chemistry and Plasma Processing,1993,13(2):69-187.

二级参考文献35

共引文献8

同被引文献75

  • 1马玉平,陈明,孙方宏.CVD金刚石涂层硬质合金衬底预处理新方法研究[J].金刚石与磨料磨具工程,2009,29(1). 被引量：7
  • 2徐锋,左敦稳,卢文壮,黎向锋,相炳坤,李磊,王珉.连续多试样纳米金刚石膜沉积设备及工艺[J].南京航空航天大学学报,2005,37(B11):63-67. 被引量：9
  • 3张秀霞,朱长纯.大面积印刷纳米金刚石薄膜的场致发射的研究[J].功能材料,2006,37(9):1488-1490. 被引量：3
  • 4Kamiya S,Yoshida N ,Tamura Y ,et al. Quantitative measurement for the effect of enhanced nucleation on the adhesive strength of diamond coatings [J]. Surface and Coatings Technology,2001,142-144: 738-742.
  • 5Temyak O,Akhvlediani R,Hoffman A. Study on diamond films with ultra high nucleation density deposited onto alumina,sapphire and quartz[J]. Diamond and Related Materials, 2005,14 ( 3 -7 ) : 323 -327.
  • 6Meng X M,Askari S J,Tang W Z,et al. Nano-crystalline CVD dimond films deposited on cemented carbide using high current extended DC arc plasma process[J]. Vacuum,2008,82(5):543-546.
  • 7Ham Y S,Kim Y K,kee J Y. Effects of argon and oxygen to the CI-h-Hz feed gas on diamond synthesis by microwave plasma enhanced chemical vapor deposition[J]. The Solid Films,1997,310(1-2):39 - 46.
  • 8Sarangi S K,Chattopadhyay A,Chattopadhyay A K. Effect of pre- treatment methods and chamber pressure on morphology,quality and adhesion of HFCVD diamond coating on cemented carbide inserts[J]. Applied Surface Science, 2008,254 ( 13 ) : 3721-3733.
  • 9Sarangi S K,Chattopadhyay A,Chattopadhyay A K. Effect of pretreatment,seeding and interlayer on nucleation and growth of HFCVD diamond films on cemented carbide tools [J]. International Journal of Refractory Metals and Hard Materials ,2008,26(3) :220-231.
  • 10Li Y S,Tang Y,Yang Q,et al. Al-enhanced nucleation and adhesion of diamond films on WC-Co substrates[J]. International Journal of Refractory Metals and Hard Materials, 2008,26 (5) : 465 -471.

引证文献4

二级引证文献24

人工晶体学报
2011年 第1期

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部