摘要
在无掩模激光光刻系统中,TI(Texa instrument,德州仪器)公司基于DLP(digital lightprocessing,数字光处理)架构的DMD(digital micromirror device,数字微镜器件)系统已经得到应用,但是存在光刻图像质量和光刻速度无法提高等瓶颈。提出采用单片FPGA控制DMD的架构,使得微镜锁定时间自由可控,在成像质量上高于DLP架构下的光刻成像质量,同时具备的同步功能和高帧频特性可大大提高光刻速度。
The maskless laser lithography system using digital micromirror device(DMD) based on digital light processing(DLP) structure was used widely,but the lithography image quality and lithography speed should be improved.A new method for solving these problems is proposed,which adopts FPGA to control DMD.The new structure enables the flexible control of micromirror lock and improves the system lithography image quality accordingly.The synchronization signal and high frame rate of the new structure improve system lithography speed.
出处
《应用光学》
CAS
CSCD
北大核心
2011年第2期363-366,共4页
Journal of Applied Optics