摘要
在深入分析击穿电压蠕变时间常数τ物理机构的基础上,进一步改进了p-n结击穿电压蠕变饱和陷阱理论,使理论与实验结果更为吻合。
Based on the analysis of the physical mechanism of the walkout time constant τ, the theory of the Walkout in p-n junction, including charge trapping saturation is improved. A good agreement between the theory and experiments is achieved.
出处
《天津大学学报》
EI
CAS
CSCD
1990年第3期17-21,共5页
Journal of Tianjin University(Science and Technology)
关键词
半导体
击穿电压
蠕变
P-N结
陷阱
breakdwn voltage walkout, reliability of semiconductor devices, hot carriers injection oxide traps