摘要
根据ISO-11254分别测量了脉宽1 ms,波长1 064 nm激光作用下TiO2/SiO2高反膜、增透膜的损伤阈值,结合高分辨率CCD和光学显微镜观测了损伤形貌,分析了毫秒量级激光损伤光学薄膜的损伤机理.结果表明:脉宽1 ms激光作用下TiO2/SiO2增透膜的损伤阈值为高反膜的2.4倍,损伤区域为若干分离的损伤点,认为损伤是由膜层中含有的缺陷或杂质引起的.读数显微镜的结果显示,长脉冲激光作用下薄膜元件的损伤厚度为(180±5)μm.研究结果可供脉宽为ms量级的激光与光学薄膜相互作用的基础研究提供参考.
Laser induced damage thresholds of TiO2/SiO2 high reflector and anti-reflector with pulse duration l ms, wavelength 1064 nm are investigated according to ISO-11254. The damage morphologies are recorded by CCD with high resolution. The mechanisms of 1 ms laser induced damage of optical component are discussed. Laser induced damage threshold of anti-reflector is 2.4 times of high reflector, and the isolated damages on coatings show that the damages are induced by impurities or the defects in coatings. The damage depth of optical component is 180 ± 5μm by using reading microscope. These research results in the paper will provide help for the basic research of long pulse laser interaction with optical coatings.
出处
《测试技术学报》
2011年第2期122-127,共6页
Journal of Test and Measurement Technology
关键词
毫秒激光
激光损伤
损伤阈值
损伤机理
millisecond laser
laser damage
damage threshold
damage mechanism
