摘要
研究了过滤阴极真空电弧技术中,不同的磁过滤器电流下(5—13A),制备的四面体非晶碳(ta-C)薄膜对摩擦学特性的影响.通过对薄膜厚度,薄膜结构以及薄膜表面粗糙度随磁过滤电流的变化结果进行了测试,结果表明,随着磁过滤器电流的增大,薄膜的sp3键含量逐渐减少,表面粗糙度从0.13增大到0.38.磁过滤器电流在5A时,薄膜的摩擦系数最小约为0.08,当电流增大到7A时,摩擦系数显著增大,磁过滤器电流从7A增大到13A时,薄膜的摩擦系数再次减小约为0.1.
Tetrahedral amorphous carbon(ta-C) films are deposited on single crystalline silicon with filtered cathodic vacuum arc by changing the magnetic filtering coil current from 5 A to 13 A.Visible Raman measurements show that the content of the sp3 hybridization decreases with magnetic filtering coil current increasing,and it deereased down to a minimum value as the coil currew increases up to 13 A.The surface morphology is investigated by atomic force microscope(AFM),and the surface roughness(RMS) of the film increases with the current of magnetic filtering coil increasing from 0.13 to 0.38,The friction test indicates that the minimum of friction coefficient is about 0.08 when the magnetic filtering coil current is 5 A.The friction coefficient increases when the magnetic filtering coil current is 7A.But the friction coefficient decreases again down to 0.1 with magnetic filtering coil current inereasing from 7 A to 13 A.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
2011年第4期530-534,共5页
Acta Physica Sinica
基金
陕西省"13115"科技创新工程重大科技专项项目计划(批准号:2009ZDKG-29)资助的课题~~
关键词
四面体非晶碳
过滤阴极真空电弧
磁过滤器电流
摩擦系数
tetrahedral amorphous carbon
filtered cathodic vacuum arc
magnetic filtering coil current
friction coefficient