在高纯氧氯化锆制取过程中絮凝剂对“二次除硅”的影响

Effect of Polymeric Flocculants in Secondary Removal of Silicon for Highpurity Zirconium Oxychloride Preparation

高纯氧氯化锆是制取高纯锆化学品的重要原材料，目前国内外多采用锆英石为原料碱熔法生产，硅的去除分两步进行：第１步是用水浸洗碱熔分解产物，大约有８５％～９０％的硅以硅酸钠的形式进入水浸液，余下ＳｉＯ２需要“二次除硅”．因此，要生产高纯产品，“二次除硅”是...

Polyacrylamide type flocculants have been used in the secondary removal of silicon in preparation of highpurity zirconium oxychloride. Under optimum conditions of the process 989% and more silicon was removed and the silicon content in final product was 00005%.