期刊文献+

对准系统中调焦机构机械摆动引入误差的补偿

Calibration of error due to mechanical swing of focusing setup in alignment system
下载PDF
导出
摘要 为了消减压印对准系统焦平面调整过程中由于机构机械不稳定性产生的对准误差,提出了拟合调整架摆动轨迹来进行软件补偿的方法。通过亚像素模板匹配算法对调焦过程中标记图像的坐标进行定位运算并分析了算法的有效性,结果说明该算法的理论误差<0.1μm。采用该算法计算随调整架摆动的标记坐标,对调整架的摆动轨迹进行了实验标定。分别考察调整架上升和下降时的摆动特性,结果显示,实验具有较好的重复性。以此为基础,建立了调整架的摆动轨迹模型及误差补偿方法,并对模型的预测补偿精度进行了实验研究。结果表明,通过预测调整架摆动轨迹并进行补偿,调焦系统机械不稳定性误差从2.84μm减小到1.29μm,可以满足2μm的总体对准精度要求。 An improved method to fit the side wobble trace of a positioning setup to compensate the software was proposed to reduce the error from the mechanical swing of the focusing setup during focus plane adjustment. The alignment mark was positioned through the sub-pixel correlation template matching algorithm and the validity of the algorithm was investigated, which shows that the resolution of the algorithm is better than 0. 1 um. The positioning algorithm mentioned above was used to calculate the coordinates of the test mark while it moved up and clown along with the focusing positioning setup and then the waving trace was characterized. Experimental results indicate that the mechanical swing trace can offer a good reproducibility, if the ascending and descending of the focusing setup are considered, respectively. Based on the experimental results, the model for the swing trace fitting was established and an error correction method was presented. Finally, experiments were performed to test the calibration accuracy of the model. Obtained results demonstrate that the error from the mechanical instability has been reduced to 1.29 um from 2.84 um, which can meet the overall alignment requirement of 2um.
出处 《光学精密工程》 EI CAS CSCD 北大核心 2011年第3期573-579,共7页 Optics and Precision Engineering
基金 国家自然科学基金资助项目(No.50975225) 中国博士后科学基金资助项目(No.20100471614) 西安理工大学博士科研启动基金资助项目(No.102-211003)
关键词 对准系统 调焦机构 机械摆动 对准误差 补偿 亚像素模板匹配 alignment system focusing setup mechanical swing aligning error compensation subpixel template matching
  • 相关文献

参考文献12

  • 1KRAUSS P R, RENSTROM P J . Imprint lithography with 25-nanometer resolution [J]. Science, 1996,272:85-87.
  • 2ZHENG L, ENGELSTAD R L, LOVEI.L E G. Investigation of overlay errors due to the interaction of optical and extreme ultraviolet mask fabrication processes [J]. Journal of Vacuum Science and Technology 13, 2005,23(6) : 3043-3046.
  • 3CHOI J, NORDQUIST K, CHERALA A, et al.. Distortion and overlay performance of UV step and repeat imprint lithography [J]. Microelectronic Engineering, 2005,79 79:633-640.
  • 4CHEN A C, FLAMHOLZ A L, RIPPSTEIN R. Overlay performance of 180 nm ground rule generation X- ray lithography aligner [J]. Journal of Vacuum Science and Technology B, 1997,15(6) : 2476-2482.
  • 5SIMON K, VLADIMRSKY O, VLADIMIRSKY Y, et al.. Overlay budget analysis for the 100 nm device generation [J]. Microelectronic Engineering, 1999,46:457-460.
  • 6王权岱,段玉岗,丁玉成,关宏武,卢秉恒.压印对正系统中标记图像几何畸变的校正[J].光学精密工程,2007,15(3):422-427. 被引量:8
  • 7WANG Q D, DUAN Y G, DINGY CH, et al.. Implementation of autofocus in alignment system for Layered imprint fabrication [J]. Transactions of Tianjin University, 2009,15(4) :294-299.
  • 8王权岱.微结构分层压印成形关键工艺研究[D].西安:西安交通大学,2009.
  • 9王海涌,费峥红,王新龙.基于高斯分布的星像点精确模拟及质心计算[J].光学精密工程,2009,17(7):1672-1677. 被引量:69
  • 10张之敬,杜芳,金鑫,张林.微小尺寸零件复杂边缘识别算法[J].光学精密工程,2009,17(2):356-361. 被引量:14

二级参考文献21

共引文献93

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部