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压电微能量采集器PZT厚膜制备及其图形化研究 被引量:1

Preparation and micro-patterning of bulk PZT thick films for piezoelectric micropower harvester
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摘要 采用环氧树脂作为中间层的真空键合技术实现体材PZT与硅片键合,再利用机械化学抛光方法将PZT减薄到适当的厚度制备了PZT铁电厚膜,构成了SiO2/Si/SiO2/Epoxy/Ag/PZT/Cr/Cu形式的压电能量采集器悬臂梁结构。基于半导体光刻技术,通过湿法化学刻蚀和切片两种方法实现了PZT厚膜图形化问题,为基于体材PZT厚膜的高性能压电能量采集器的研制打下了良好的基础。 Bulk PZT thick films for piezoelectric micropower harvester were prepared through bonding the bulk PZT to silicon wafer in vacuum with the epoxy resins used as intermediate adhesive layer,then the PZT piece was thinned down and lapped to a suitable thickness to prepare the ferroelectic PZT thick films,thus providing a cantilever structure of piezoelectric micropower harvester made from SiO2/Si/SiO2/Epoxy/Ag/PZT/Cr/Cu.Based on the semiconducting lithography,the micro patterning of PZT thick films was implemented via the wet chemical etching technique and dicing method.A firm foundation was therefore laid down for the research and development of piezoelectric micropower harvester with high performance.
出处 《真空》 CAS 北大核心 2011年第2期19-21,共3页 Vacuum
基金 科技部国际合作项目(2009DFB10330) 上海市国际科技合作基金(08230705500) 国家自然科学基金(60876082) 新世纪优秀人才支持计划(2009) 江西省科技厅对外科技合作项目(No.2010EHAO2500)
关键词 压电能量采集器 真空键合 PZT(锆钛酸铅)厚膜 湿法化学刻蚀 振动 piezoelectric energy harvester vacuum bonding PZT(lead zirconate-titanate) thick film wet chemical etching vibration
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  • 1HU Yuantai1,2,HU Hongping2 & YANG Jiashi3 1. Institute of Mechanics and Sensing Technology,Central South University,Changsha 410083,China,2. Department of Mechanics,Huazhong University of Science and Technology,Wuhan 430074,China,3. Department of Engineering Mechanics,University of Nebraska,Lincoln,NE 68588-0526,USA.A low frequency piezoelectric power harvester using a spiral-shaped bimorph[J].Science China(Physics,Mechanics & Astronomy),2006,49(6):649-659. 被引量:9
  • 2郑可炉,褚家如,鲁健,李恒.PZT铁电薄膜湿法刻蚀技术研究[J].压电与声光,2005,27(2):209-212. 被引量:9
  • 3[5]Ezhilvalavan S,Samper Victor D.Ferroelectric properties of wet-chemical patterned PbZr0.52Ti0.48O3 films[J].Applied Physics Letter,2005,86(7):2901-2903.
  • 4[6]Mancha S.Chemical etching of thin film PLZT[J].Ferroelectrics,1992,135:131-137.
  • 5[7]Miller R A,Bernstein J J.A novel wet etch for patterning lead zirconate-titanate (PZT) thin-films[J].Integrated Ferroelectrics,2000,29:225-231.
  • 6[8]Zheng Kelu,Lu Jian,Chu Jiaru.A novel wet etching process of Pb(Zr,Ti)O3 thin films for application in microelectromechanical system[J].Japanese Journal of Applied Physics,2004,43 (6B):3934-3937.
  • 7[1]Itoh T,Lee C,Chu J,et al.Independent parallel scanning force microscopy using Pb (Zr,Ti) O3 microcantilever array[A].Proceeding of IEEE Micro Electro Mechanical System[C].Nagoya (Japan):IEEE,1997.78-83.
  • 8[2]Poor M R,Fleddermann C B.Measurements of etch rate and film stoichiomertry variations during plasma etching of lead-lanthanum-zirconium-titanate thin films[J].J Appl Phys,1991,70(6):3385-3387.
  • 9[3]Title M A,Walpita L M,Chen W,et al.Reactive ion beam etching of PLZT electrooptic substrates with repeated self-aligned masking[J].Applied Optics,1986,25(9):1508-1510.
  • 10[4]Charlet B,Davies K E.Dry etching of PZT films in an ECR plasma[A].Materials Research Society symposium Proceedings[C].Pittsburgh (USA):Materials Research Society,1993.310-363.

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