摘要
介绍了合肥电子储存环新凸轨注入系统中将采用的超高真空陶瓷镀钛真空室的研制状况。对穿过真空室镀膜的脉冲磁场特性进行了理论分析与计算。讨论了不同的镀膜厚度及方式对脉冲磁场均匀性的影响，用跟踪程序计算了注入过程磁场径向不均匀性对束流轨道的扰动，给出了涡流引起的磁场径向不均匀性最大允许值。
Status of developing a coated ceramic chamber for the new injection bump system of the HLS ring is presented. Shielding effects of the coating film to the pulsed magnetic field which penetrates through the chamber are analyzed and calculated.Several coating schemes are studied and discussed. Orbit perturbation caused by the error field during injection is calculated by tracking code. The maximum allowed error is determined.
出处
《强激光与粒子束》
EI
CAS
CSCD
北大核心
1999年第3期379-384,共6页
High Power Laser and Particle Beams
基金
国家重大科学工程项目经费资助课题
