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镀金液中铜杂质的分光光度分析 被引量:7

Spectrophotometric Analysis of Copper Ion in Gold Plating Solution
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摘要 高可靠微电子封装的镀金液中铜离子是有害杂质,最高允许含量为 25 m g/L。用2,9-二甲基-4,7-二苯基-1,10-邻菲罗啉(向红亚铜灵)作显色剂,采用pH 值为4 的缓冲体系,在乙醇介质中,于475 nm 波长处对镀金液中的微量铜杂质直接进行分光光度测定。本法具有快速、简便等特点,且镀液中的其他成分对分析干扰小,适合现场使用。 A method is given for direct determination of trace copper in gold plating bath by using 2, 9\|Dimethy1\|4,7\|diphenyl\|1,10\|phenan\|throline (bathocupronic) as color reagent in this paper. Buffering solution is used to maintain pH to 4. And ethanol is chosen to be solvent. The transmittance is measured at 475 nm. This method is rapid and simple. other compositions in the gold plating solution do not interfere the determination. The method is suitable for the application in situ.
出处 《材料保护》 CAS CSCD 北大核心 1999年第10期17-17,28,共2页 Materials Protection
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参考文献2

  • 1杨晓战,电子工艺技术,1998年,19卷,1期
  • 2沈卓身,半导体技术,1996年,21卷,5期

同被引文献18

  • 1何晓梅.基体分离-ICP-AES法测定镀金液中铅、铜、铁、镍的研究[J].冶金分析,2005,25(1):39-41. 被引量:9
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  • 8(GJB1941 94)金电镀层规范
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