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X-ray reflectivity and atomic force microscopy studies of MOCVD grown AI_xGa_(1-x)N/GaN superlattice structures

X-ray reflectivity and atomic force microscopy studies of MOCVD grown AI_xGa_(1-x)N/GaN superlattice structures
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摘要 The grazing incidence X-ray reflectivity(GIXR) technique and atomic force microscopy(AFM) were exploited to obtain an accurate evaluation of the surfaces and interfaces for metalorganic chemical vapor deposition grown AlGaN/GaN superlattice structures.The X-ray diffraction results have been combined with reflectivity data to evaluate the layer thickness and Al mole fraction in the AlGaN layer.The presence of a smooth interface is responsible for the observation of intensity oscillation in GIXR,which is well correlated to step flow observation in AFM images of the surface.The structure with a low Al mole fraction(x = 0.25) and thin well width has a rather smooth surface for the R,of AFM data value is 0.45 nm. The grazing incidence X-ray reflectivity(GIXR) technique and atomic force microscopy(AFM) were exploited to obtain an accurate evaluation of the surfaces and interfaces for metalorganic chemical vapor deposition grown AlxGa1-xN/GaN superlattice structures.The X-ray diffraction results have been combined with reflectivity data to evaluate the layer thickness and Al mole fraction in the AlGaN layer.The presence of a smooth interface is responsible for the observation of intensity oscillation in GIXR,which is well correlated to step flow observation in AFM images of the surface.The structure with a low Al mole fraction(x = 0.25) and thin well width has a rather smooth surface for the Rrms,of AFM data value is 0.45 nm.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2011年第4期48-51,共4页 半导体学报(英文版)
基金 Project supported by the National Natural Science Foundation of China(No60876008) the Science and Technology Program of the Educational Office of Fujian Province,China(NoJA 10249)
关键词 metalorganic chemical vapor deposition INTERFACES SURFACES nitrides SUPERLATTICES high resolution X-ray diffraction metalorganic chemical vapor deposition; interfaces; surfaces; nitrides; superlattices; high resolution X-ray diffraction;
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