利用光刻机挡板优化MPW光罩布局

Optimize MPW Mask Layout by Blind Board

伴随着国内市场竞争的日趋激烈,常规的MPW(多项目晶圆)布局也不能满足客户的要求,同时也不能最大限度地降低设计公司的研发成本,也不利于国内foundry厂市场的开拓。鉴于此,文章着重提出了利用光刻机挡板把光罩进行区域划分,在不增加流片和满足客户要求的前提下,使光罩得到最大限度的利用,降低了客户的流片费用。通过在15cm片上流片验证,更加突出了此优化光罩布局的方法在研发成本和满足客户要求等方面的优越性,因而这种布局对我国集成电路的发展和新产品的研发工作,特别是对国内中小企业的成长提供了有力的支持,也为foundry厂赢得市场提供了重要的手段。

With internal more and more fierce marketable competition,normal MPW layout do not meet the need of customer and not reduce research cost to a minimum,and not benefit market development for foundry.So this paper emphasize introducing to divide mask into different areas by lithography blind board to make maximal use based on no added wafer and meeting the need of customer,So it reduces the customer tape-out cost.By tape-out verification based on 6 inch product line,it has the superiority over the normal layout about customer scientific research cost and requirement.So it is important for development of IC and new product,especially supporting for small-and medium-sized enterprises growth,and also it is important means for foundry to gain market.