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基于渐近解的成像电子光学近轴横向像差理论及其验证 被引量:5

On Theory and Verification for Paraxial Lateral Aberrations of Imaging Electrostatic Electron Optics Based on Asymptotic Solutions
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摘要 在成像电子光学系统的横向像差中,近轴像差是整个像面普遍存在、且影响图像中心像质的主要像差,并决定了系统的极限分辨率.本文由电子光学近轴方程的渐近解推导了近轴横向像差的普遍表示式,并通过一两电极静电同心球系统,推导了近轴轨迹特解的渐近解和精确解的解析表示,给出了二级和三级近轴色球差以及三级近轴放大率色差的表达式,证明了基于渐近解求解成像电子光学系统的近轴横向像差的途径是可行的和足够精确的.文中给出的近轴横向像差的简明形式对于成像电子光学系统的像差研究和像管设计具有实际意义. In lateral aberrations of an imaging electron optical system,the paraxial lateral aberrations exit widespread in the whole image plane and that is also the main aberrations which effect image quality of central image and determine limiting image resolution of system.In the present paper,the paraxial lateral aberrations expressed in general form have been derived emphatically by using asymptotic solutions of paraxial equation for imaging electron optics.By using a bi-electrode electrostatic concentric spherical system model,the analytical forms of two special solutions of paraxial rays expressed by asymptotic and accurate solutions have been deduced and tested.The paraxial sphero-chromatic aberrations of second and third order,as well as the paraxial chromatic aberration of magnification of third order,have been deduced.Result completely proves that the approach based on asymptotic solutions to solve the paraxial lateral aberrations is accurate enough and practicable.A simple and clear form for expressing paraxial lateral aberrations of imaging electron optical systems is suggested for practical use,which will have practical significance for study of aberrations of imaging electron optics and for design of image tubes.
作者 周立伟 公慧
出处 《电子学报》 EI CAS CSCD 北大核心 2011年第3期619-625,共7页 Acta Electronica Sinica
基金 国家自然科学基金(No.60771070) 高等学校博士点专项基金(No.B117)
关键词 电子光学成像系统 静电阴极透镜 电子光学的像差理论 近轴横向像差 近轴放大率色差 electron optical imaging systems electrostatic cathode lenses aberration theory of electron optics paraxial lateral aberrations paraxial chromatic aberration of magnification
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  • 1M A Monastyrski, Y V Kulikov. On chromatic aberrations in cathode lenses [ J ]. Radiotechnics and Electronics, 1976, 21 (10) :2251 -2254. (in Russian).
  • 2M A Monastyrski. On asymptotic solutions of paraxial equation of electron optics[ J]. Journal of Technical Physics, 1978,48 (6) : 1117 -1122. (in Russian).
  • 3周立伟,M A Monastyrski.,M Ya Schelev,张智铨,李元.关于Tau变分法研究电子光学成像系统的时间像差理论[J].电子学报,2006,34(2):193-197. 被引量:2
  • 4B A Banshitet. On computation of aberrations in cathode lenses [J]. Radiotechnics and Electronics, 1964,9(5):844-850. (in Russian ).
  • 5V M Kelman, et al. Theory of cathode lenses, H, Electrostatic lenses withaxial symmetrical fields [ J ]. Jourllal of Technical Physics, 1973,43(1) :52 -56. (in Russian).
  • 6Y V Kulikov, M A Monastyrski, et al. Theory of aberrations of third order incathode lenses, aberrations of cathode lenses in combined electrical and magnetic fields [ J ]. Radiotechnics and Electronics, 1978,23(1):167-174. (in Russian).
  • 7M A Monastyrski, Y V Kulikov. Theory of aberrations of third order in cathode lenses, chromatic aberrations[ J]. Radiotechnics and Electronics, 1978,23(3)644-647. (in Russian).
  • 8周立伟 艾克聪 潘顺臣.复合电磁聚焦阴极透镜的像差理论.物理学报,1983,32(3):376-392.
  • 9Ximen Jiye, Zhou Liwei, Ai kecong. Variafionai theory of aberrations in cathode lenses[ J]. Optik, 1983,66( 1 ): 19 -34.
  • 10Zhou Liwei. On theory of paraxial lateral aberrations in imag-ing electrostatic electron optics based on asymptotic solutions [A ]. International Symposium on Photoelectmnic Detection and imaging, Technology and Applications[ C]. Beijing: SPIE, 2007.6621:662101 -1 -12.

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