热处理温度和掺杂浓度对AZO薄膜微结构的影响

Effects of Annealing Temperature and Al Doping Concentration on the Structure of AZO Thin Films

采用溶胶-凝胶法在普通裁玻片上制备了（002）择优取向的AZO薄膜，研究了不同的热处理温度和掺杂浓度对薄膜微结构的影响。利用XRD和SEM表征了AZO薄膜晶体结构的择优取向和表面形貌。结果表明，热处理温度为450℃，择优取向最强，热处理温度高于或低于450℃时，择优取向都减弱；当掺杂浓度为2％时，AZO的择优取向最强，随着Al掺杂浓度的增大，薄膜的晶粒尺寸减小，薄膜变得更加致密。

AZO thin films have been prepared on glass by sol--gel dip coating. The effect of annealing temperature and Al doping concentration on the structure of AZO thin films. And the preferential orientation and surtace morphology were characterized by XRD and SEM, respectively. The results indicate that AZO thin films with strongest preferential orientation are obtained annealed at 450℃. When the annealing temperature higher or lower than 450℃,the preferred orientation will be weakened. With the Al--doping concentration increasing,the crystal grain becomes smaller,and the film becomes more dense.