摘要
利用 Ｘ射线光电子能谱仪和接触角方法研究表征了 Ｃ Ｆ４ Ｃ Ｈ４ 混合气体 Ｒ Ｆ等离子体改性 Ｐ Ｅ Ｔ的表面特征根据沉积速率可将整个浓度范围分为三个区域，各区域内等离子体作用机制不同区域１（０～８３．３％ ）为等离子体聚合区域；区域２（８３．３～９６．２％ ）内聚合起主要作用，刻蚀起次要作用，区域３（９６．２～１００％ ）内刻蚀和氟化接枝起主要作用借鉴表面吸附反应动力学模型，推导出等离子体表面类吸附反应动力学方程式。
PET surface modification by RF plasma of CF 4 CH 4 monomers was subject to characterized by XPS and the contact angle method. According to the change of deposition rate in the entire range of CF 4 in CF 4 CH 4 mixture, the whole process can be divided into three regions, which are distinguished by their mechanistic aspects of PET surfaces exposed to CF 4 CH 4 plasmas. Region 1(0~83.3% CF 4) is a region of plasma polymerization. Region 2(83.3~96.2% CF 4) is a predominant region of polymerization, whereas, etching is a subordinate factor. Region 3(96.2~100% CF 4) is a predominating region of etching/fluorination. By using the experienece of the kinetics of surface adsorption adsorption reactions, the plasma kinetics equation of surface adsorption like reactions is deduced. The theoretical estimation of deposition rate exhibits a good agreement with the experimental data.
