期刊文献+

退火温度对钴铁氧体薄膜结构和性能的影响 被引量:3

Influence of Annealing Temperature on Microstructure and Magnetic Properties of Co-ferrite Thin Films
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摘要 采用溶胶-凝胶法结合匀胶旋涂工艺在复合基片(Pt/Ti/SiO2/Si)上制备了钴铁氧体(CoFe2O4)薄膜,利用XRD、SEM、VSM分析了薄膜的微结构以及磁性能,研究了不同退火温度对钴铁氧体薄膜的结构和磁性能的影响。结果表明,钴铁氧体在500℃时开始形成尖晶石相。随着退火温度的增高,钴铁氧体晶粒逐渐长大,饱和磁化强度和矫顽力逐渐增强,到600℃时,尖晶石相已经非常明显,晶粒尺寸大小均一,饱和磁化强度和矫顽力分别为427.48 emu.cm-3和1224.11 Oe,当退火温度提高到700℃时,晶粒进一步长大,但是薄膜中出现反铁磁相α-Fe2O3,而且薄膜表面出现了气孔和晶粒大小不均匀等缺陷,导致饱和磁化强度和矫顽力下降。 Co-ferrite thin films have been synthesized on Pt/Ti/SiO2/Si substrates by the sol-gel spin-coating technique annealed at temperatures ranging from 400 to 700 ℃ in air.The structure and magnetic properties were analyzed by X-ray diffraction,scanning electron microscopy and vibrating sample magnetometer.Impact of different annealing temperature on microstructure and magnetic properties of Co-ferrite thin films was also dealt with.The results show that spinel phase begins to form at 500 ℃,and the grain size,saturation magnetization and coercivity increase gradually with the increase of annealing temperature.When annealing temperature is 600 ℃,the spinel phase exists,the distribution of grain particle sizes is uniform,saturation magnetization and coercivity are 427.48 emu·cm-3 and 1224.11 Oe,respectively.When the annealing temperature is 700 ℃,the grain grew further,but the anti-ferromagnetic α-Fe2O3 exists and cracks appear,which leads to the decrease of saturation magnetization and coercivity.
出处 《金属功能材料》 CAS 2011年第2期37-41,共5页 Metallic Functional Materials
基金 教育部高等学校博士学科点专项科研基金新教师项目(200803591037) 合肥工业大学博士学位专项基金(GD-BJ2008-008) 合肥工业大学2009年科技创新群体项目 合肥工业大学2010年大学生创新性实验计划项目(cxsy102096)
关键词 CoFe2O4薄膜 退火温度 微结构 磁性 CoFe2O4 thin films annealing temperature microstructure magnetic properties
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参考文献24

  • 1Cheng F X, et al. [J]. Journal of Applied Physics, 1999, 86 (5) : 2727-2732.
  • 2Suzuki Y, et al. [J]. Applied Physics Letters, 1996, 68(5): 714-716.
  • 3Kitamoto Y, et al. [J]. Journal of Applied Physics, 1999, 85 (8) :4708-4710.
  • 4金沈贤,钟智勇,张怀武.高矫顽力CoFe_2O_4薄膜的研究进展及矫顽力机理分析[J].磁性材料及器件,2007,38(5):8-11. 被引量:4
  • 5Eerenstein W, et al. [J]. Nature, 2006, 442(7104):759- 765.
  • 6Nan C W, et al. [J]. Journal of Applied Physics, 2008, 103 (3) :031101-031135.
  • 7Lisfi A, et al. [J]. Applied Physics Letters, 2003, 82(1): 76 -78.
  • 8Grigorova M, et al. [J]. Journal of Magnetism and Magnetic Materials, 1998, 183(1-2): 163-172.
  • 9Maat S, et al. [J]. Applied Physics Letters, 2002, 81(3): 520-522.
  • 10Inui C, et al. [J]. Thin Solid Films, 2008, 516(9): 2454- 2459.

二级参考文献30

  • 1成正维,田卫东,胡全利,严雪琴,鲜于泽.Ba铁氧体溅射薄膜的研究[J].功能材料,1994,25(2):172-175. 被引量:2
  • 2[1]Shinobu Fujihara, Junko Kusakado, Toshio Kimura.[J].Journal of Materials Science Letters, 1998, 17:781.
  • 3[2]Nakanishi Y, Miyake A, Kominami H, et al.[J]. Applied Surface Science, 1999, 142:233.
  • 4[3]Dietl T, Ohno H, Matsukure F.[J]. J. Clibert, D. Ferrand,Science, 2000, 287:1019.
  • 5[4]Liu Y, Gorla C R, Liang S, et al.[J]. J. Elec. Mater., 2000,29(1):60.
  • 6[5]Tabata H, Saeki M, et al. [J]. Physica B, 2001,308-310:993.
  • 7[6]Hyeon-Jun Lee, Se-Young Jeong ,Chae Ryong Cho, et al.[J].Appl. Phys. Lett. 2002,81:4020.
  • 8[7]Fang Z B, Gong H X, Liu X Q, et al.[J]. Acta. Phys. Sin.,2003,52:1748.
  • 9[8]Parker R J.[J]. Ferrite, Proc. 1CF-3,1980:375.
  • 10Ding J,Gong H,Melaka R,et al.[J].J Magn Magn Mater,2001,226-230:1382-1384.

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