喷涂法制备缓冲层CuI薄膜的生长(英文)

Growth of CuI buffer layer prepared by spraying method

采用乙腈为溶剂的喷涂工艺制备晶粒尺寸约为35nm的CuI薄膜。研究乙腈溶液中碘掺杂浓度对CuI薄膜结构、形貌和光学性能的影响。XRD衍射结果表明:碘掺杂的CuI薄膜具有γ态立方闪锌矿结构,沿(111)晶面择优取向生长。SEM结果显示CuI薄膜的微结构与乙腈溶液中碘掺杂量有关;当乙腈溶液中掺杂碘为0.025g时,所制备的CuI薄膜均匀、致密,在可见光区域光学透过率可达75.4%,禁带宽度接近2.96eV。

CuI thin films with nano-scale grains of about 35nm were deposited via spraying method with using acetonitrile as solvent. The influence of iodine doping concentration in acetonitrile solution on the structure, topographic and optical properties of CuI thin films was investigated. X-ray diffraction results showed that CuI iodine-doped films doped CuI：I2 were in γ-phase of zinc blende structure with （111） preferential plane. Scanning electron microscopy revealed that the microstructure of CuI films depended on the relative amount of doping iodine in the solution. When the iodine doping amount in acetonitrile solution was 0.025 g, the film was uniform and compact, the optical transmittance was 75.4% in the part of visible region and the energy band gap was close to 2.96 eV.