溅射功率对NdFeB薄膜形貌的影响

The Different Sputtering Power′s Influences on Symmetrical Structure of NdFeB Thin Films

采用直流磁控溅射方法在玻璃基片上制备出厚度约400 nm的NdFeB薄膜,使用不同的溅射功率,利用扫描电镜分析不同溅射功率对薄膜微观组织的影响,并采用真空退火使之晶化,使用XRD衍射仪、扫描电镜分析晶化情况及组织变化,以期得到最佳的制备工艺。通过对30,50,100 W三组样品进行对比,得出以下结论:在30 W功率下溅射,得到的样品具有最为均匀平整的组织形貌;随着溅射功率的加大,在试样非晶基体上,会出现弥散分布的富Fe相;而且随功率的增大,组织变得疏松,使得退火后仍难以得到较为良好的晶态组织。通过对100 W溅射样品退火后组织的观察,发现大功率溅射态试样的晶化会变得困难,同在550℃和15 min保温的退火条件下,100 W试样仍然存在非晶态的絮状组织,且组织不均,性能较差。

Prepared thin films of NdFeB and that thickness is 400 nm by DC magnetron sputtering on glass,adopting different sputtering powers,useing SEM analyzed the different sputtering′s influences on microcosmic organization of thin films.And annealing in vacuum bring it crystallization.Adopting XRD,SEM analyzed it′s crystallization and microcosmic organization to find topgallant preparation technics.Pass contrasted the 3 sample that＇s power separate is 30,50,100 W,we can find that,when the sputtering power is 30 W,the sample have best symmetrical structure.Along with accretion of the sputtering power,in the matrix of sample will appeared dispersed Fe-rich phase.further more,It＇s organization to become loose,after annealing is still difficult to make more good crystalline organization.And by 100 W sputtering after annealing the sample observation of the organization.We found that high-power sputtering state crystallization of the sample will become difficult.Also at 500 ℃ 15 minutes warming annealing conditions,100 W floc samples remain amorphous organization and the organization uneven,poor performance.