光栅参数测量技术研究进展

Progress in grating parameter measurement technology

光栅参数测量技术是衡量光栅制作水平的重要标准。本文从直接测量法和间接测量法两个角度对现阶段较成熟的光栅参数测量技术进行了研究。重点介绍了原子力显微镜(AFM)测量法、扫描电子显微镜(SEM)测量法、激光衍射(LD)测量法以及散射测量术的测量原理和研究进展,指出了这些方法各自的优缺点和适用范围。AFM测量法和SEM测量法均可测得光栅的局部形貌信息,可用于检测光栅表面形貌缺陷;LD测量法和散射测量术反映的是激光照射区域的平均结果,其中LD测量法能得到光栅周期参数,而椭偏测量术能得到光栅周期以外的其他形貌参数。这些方法测得的光栅参数结果比较吻合,其中LD测量法不确定度最小,AFM次之,SEM最大。文章最后对未来光栅参数测量技术的发展方向进行了论述。

Grating parameter measurement technology is a key evaluation criterion of grating fabrication.This paper introduces several kinds of grating measuring methods that have been relative mature in present.It focuses on the Atomic Force Microscopy（AFM） method,Scanning Electron Microscopy（SEM）,Laser Diffraction（LD） method and scattering measuring method（ellipsometry）,and describes their working principles,developing trends and their own advantages and disadvantages.It points out that the AFM and SEM methods can measure the local profile of a grating and can get its surface profile defect.The LD method and scattering method can reflect average results of a laser radiation region,in which the LD method can give the grating period parameters and the ellipsometry can offer the other parameters except the period parameters.Furthermore,the grating parameters gotten by these method are identical,and the LD method provides a minimum uncertainty,the AMF method comes second and the SEM is the last one.In the end,it discusses the developing directions of grating parameter measurement technologies.