摘要
目的:验证牙菌斑中超氧化物阴离子自由基与菌斑氧化还原电位的关系。方法:①测试菌斑氧化还原电位。②利用SOD作为干扰因素观察氧化还原电位的变化。结果:菌斑电位低于非菌斑牙面电位,为负电位。菌斑加SOD后使菌斑电位升高。结论:菌斑负电位与超氧化物阴离子自由基有关,自由基可能是菌斑负电位形成的主要因素。
Objective: To investigate the relationship between superoxide anion free radical and redox potential in dental plaque. Methods: Redox potential in dental plaque was measured before and after addition of SOD dilution to the same spot of the plaque,the changes of redox potential were observed. Results: Negative potential was observed on dental plaque.The addition of SOD increased the potential of dental plaque . Conclusions: Superoxide anion free radical seems to play a crucial role in the formation of negative potential of dental plaque.
出处
《实用口腔医学杂志》
CAS
CSCD
北大核心
1999年第4期269-270,共2页
Journal of Practical Stomatology
关键词
牙菌斑
氧化-还原电位
龋齿
超氧化物
阴离子
Dental plaque
Oxidationreduction potential
Dental caries
Superoxide
Anions
Free radicals
Saperoxide dismutase