硅片湿法清洗工艺技术及设备发展趋势

Wafer Suface Wet Chemistry Rinse Technics And Equipment Making Technology

简要介绍了硅片湿化学清洗工艺技术及清洗设备结构技术,包括一些典型的槽体结构、干燥工艺技术等。并就清洗技术的发展需要,阐述未来清洗设备的发展趋势。

This article introduces wafer surface wet chemistry technics and Rinse equipment making technology,including some typical benches structure,drying technology and so on.This article describe The RCA Rinse equipment development roadmap in times to come.