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高温含铅碱液中690TT合金氧化膜的耐蚀性能

Corrosion resistance of oxide films formed on alloy 690TT in high temperature lead-containing caustic solution
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摘要 利用静态高压釜,在330℃的10%NaOH+10 g/L PbO腐蚀介质中,对690TT合金进行5～60 d的浸泡实验,结果表明:690TT合金氧化膜由NiO、NiFe2 O4和NiCr2 O4构成。合金的氧化膜分层,靠近基体的腐蚀产物为混杂的富Cr和富Ni氧化物,是沿晶腐蚀和表面均匀腐蚀综合作用所致。中间层主要以NiCr2O4为主,外层是NiFe2O4以及NiO。氧化膜同时具有n型和p型半导体特征,内层富Cr的氧化物为p型半导体,而外层富Fe的氧化物为n型半导体。 Immersion tests were carried out in 10% NaOH ＋ 10 g/L PbO solution at 330 ℃ in a static autoclave.The results show that the lamellar oxide films of alloy 690TT consist of NiO,NiFe2 O4 and NiCr2 O4.Internal corrosion products closing to substrate formed due to intergranular attack and general corrosion contain mixed nickel-rich oxide and chromium-rich oxide.The intermediate layer of oxide film is NiCr2 O4 spinel oxide and the outer layer consists of NiFe2 O4 and NiO.The oxide film,which consists of an internal chromium-rich oxide layer and an external iron-rich oxide layer,characterizes p-type and n-type semiconductivity,respectively.
作者 胡轶嵩 王俭秋 柯伟 韩恩厚
机构地区 中国科学院金属研究所金属腐蚀与防护国家重点实验室
出处 《材料热处理学报》 EI CAS CSCD 北大核心 2011年第4期116-121,共6页 Transactions of Materials and Heat Treatment
基金 国家"973"项目(G2006CB605002)
关键词 690TT合金 氧化膜 半导体 沿晶腐蚀 alloy 690TT oxide film semiconductor intergranular attack
分类号 TG172.9 [金属学及工艺—金属表面处理]
  • 相关文献

参考文献16

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材料热处理学报
2011年 第4期

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