期刊文献+

The Effect of Unbalanced Coefficient of Magnetron on the Structure and Properties of CN_x Coatings 被引量:1

The Effect of Unbalanced Coefficient of Magnetron on the Structure and Properties of CN_x Coatings
下载PDF
导出
摘要 The effect of unbalanced coefficient of magnetron (UCM) on the structure and tribological properties of CrNx hard coatings was studied.The CrNx coatings were deposited on both Si wafer and hardened tool steel substrates using a closed-field unbalanced magnetron sputtering ion plating technique in a gas mixture of Ar+N2 under different unbalanced magnetron conditions.The coatings were characterized by means of XRD,XPS,SEM,microhardness tester and pin-on-disc tribometer to study respectively their structure,chemical bonding state,microstructure,hardness and tribological properties.The experimental results show that the UCM has a profound effect on the structure,hardness and tribological properties of the CrNx coatings.With increasing the values of UCM,the dominant phases in the deposited coatings evolved from Cr+Cr2N to Cr2N+CrN,the microstructure became denser and the hardness increased;in addition,reduced coefficient of friction and improved wear resistance of CrNx coatings were also observed under a larger UCM. The effect of unbalanced coefficient of magnetron (UCM) on the structure and tribological properties of CrNx hard coatings was studied.The CrNx coatings were deposited on both Si wafer and hardened tool steel substrates using a closed-field unbalanced magnetron sputtering ion plating technique in a gas mixture of Ar+N2 under different unbalanced magnetron conditions.The coatings were characterized by means of XRD,XPS,SEM,microhardness tester and pin-on-disc tribometer to study respectively their structure,chemical bonding state,microstructure,hardness and tribological properties.The experimental results show that the UCM has a profound effect on the structure,hardness and tribological properties of the CrNx coatings.With increasing the values of UCM,the dominant phases in the deposited coatings evolved from Cr+Cr2N to Cr2N+CrN,the microstructure became denser and the hardness increased;in addition,reduced coefficient of friction and improved wear resistance of CrNx coatings were also observed under a larger UCM.
作者 文晓斌 李显
出处 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2011年第2期274-280,共7页 武汉理工大学学报(材料科学英文版)
基金 Funded by the National High-technology Research and Development Programm of China(No.2005AA33H010)
关键词 magnetron sputtering unbalanced coefficient CrNx coating structure properties magnetron sputtering unbalanced coefficient CrNx coating structure properties
  • 相关文献

参考文献16

  • 1Stafstrom S, Hultman L, Hellgren N. Predicted Stability of a New aza[60] Fullerene Molechle, C48N12[J]. Chem. Phys. Lett., 2001, 340:227-231.
  • 2Bertromd G, Savall C, Meuuier C. Properties of Reactively RF Magnetron-sputtered Chromium Nitride Coatings[J]. Surf. Coat. Technol., 1997, 96:323-329.
  • 3Zhao Z B, Rek Z U, Yalisove S M, et al. Phase Formation and Structure of Magnetron Sputtered Chromium Nitride Films:in-situ and ex-situ Studies[J]. Surf. Coat. Technol, 2004, 185:329-39.
  • 4Musil J, Baroch P, Vlcek J, et al. Reactive Magnetron Sputtering of thin Films: Present Status and Trend[J]. Thin Solid Films, 2005, 475:208-218.
  • 5Han S, Lin J H, Wang G H, et al. The Effect of Preferred Orientation on the Mechanical Properties of Chromium Nitride Coatings Deposited on SKD 11 by Unbalanced De- posi-magnetron Sputtering[J]. Mater. Lett., 2003, 57:1202.
  • 6Paldey S, Deevi S C. Properties of Single Layer and Gradient (Ti,Al)N Coatings[J]. Mater. Sci. Eng. A, 2003, 361:1-8.
  • 7Zhang G A, Yan P X, Wang P, et al. Influence of Nitrogen Content on the Structural, Electrical and Mechanical Prop- erties of CrNx thin Films[J]. Mater. Sci. Eng. A, 2007, 460-461:301-305.
  • 8Han Z H, Tian J W, Lai Q x, et al. Effect of N2 Partial Pressure on the Microstructure and Mechanical Properties of Magnetron Sputtered CrNx Films[J]. Surf. Coat. Technol., 2003, 162:189-193.
  • 9Zhang Z G, Rapaud O, Bonasso N, et al. Control of Micro- struture and Properties dc Magnetron Sputtering Deposited Chromium Nitride Films[J]. Vacuum, 2008, 82:501-509.
  • 10Wei G, Scharf T W, Zhou J N, et al. Nanotribology Studies of Cr, Cr2N and CrN thin films Using Constant and Ramped load nan-oscratch Techniques[J]. Surf. Coat. Technol., 2001, 146-147:357-362.

同被引文献1

引证文献1

二级引证文献3

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部