摘要
利用正交设计试验方法，找到了利用化学腐蚀法制作近场扫描光子显微镜尖端的主要影响因素及各因素的最佳组合水平状态，利用正交设计试验所得结果， 可制得曲率半径小于１２０ｎｍ 的尖端．
The method of orthogonal array was carried out on preparing tip applied for near-field optical microscopy which was got by chemical etching. The principal influencing factors and the best level of multifactor were found. Using this method, the tip of less than 120nm curvature radius was prepared.
