硫化镉纳米膜的生物还原-化学沉淀耦合制备及其性能表征

Preparation and Characterization of CdS Nano Film by CRBRCP-EDTA Process

本文应用生物还原-化学沉淀耦合反应（CRBRCP-EDTA）制备出硫化镉纳米薄膜,并借助XRD和SEM对合成材料的物相、结构、形貌进行了表征。研究表明,以铝片为基底时CdS难以沉积,CdS纳米薄膜不能形成;以导电玻璃和单晶硅片为基底时CdS纳米薄膜方可生成。导电玻璃和单晶硅片薄膜都是双层结构,导电玻璃薄膜下层厚度大约40~50 nm,上层厚度大约450~500 nm,整体厚度大约500~550 nm;硅片薄膜的上下两层厚度基本相等,均为300 nm左右,而整体厚度达到600~650 nm。Cd2＋浓度增加和分散剂PAM加入显著改善了导电玻璃薄膜质量,膜的致密性、均匀性和光催化活性都有所提高。

The CdS nano film was prepared by CRBRCP-EDTA process,and the phase,structure and morphology of the nano film was characterized by XRD and SEM.The results showed that the nano film formed well when using conductive glass and monocrystalline silicon wafer as a basement,the film can not formed with aluminium sheet.Both the conductive glass-based and the monocrystalline silicon wafer-based nano film was double-layer structure.The thickness of lower layer of the conductive glass-based film was about 40~50 nm,450~500 nm with upper layer and 500~550 nm with the total film;for the monocrystalline silicon wafer-based nano film,the thickness of both layer was about 300 nm,600~650 nm with the total film.The increase of Cd2＋ dose and addition of PAM were benefit to the preparation of the conductive glass-based nano film,leading to improvement of the formed nano film in compactness,uniformity and photocatalytic activity.