脉冲多弧离子镀沉积类金刚石薄膜的牢固度研究

Adhesion of diamond like carbon films prepared by pulse arc plasma deposition

利用脉冲多弧离子镀技术在硅基片上沉积类金刚石薄膜．分析了类金刚石薄膜的牢固度与各种工艺条件的关系．实验结果表明：基片的清洗、基片温度、主回路电压、脉冲频率、烘烤处理都强烈影响类金刚石薄膜的牢固度．

Diamond like carbon films are prepared on silicon by pulse arc plasma deposition. The relationships between adhesion of the deposited films and deposition parameters have been systematically analysed. The results show that methods to clean substrate, substrate temperature, voltage U across the interelectrode, frequency of pulse and annealing greatly effect adhesion of the deposited films. It is theoretically proved that ion beam assistant deposition helps strengthen adhesion of the deposited films.