真空蒸镀预熔→蒸发过渡电流变化率对光控膜物理特性的影响

The rate of variation of evaporate transition current influencing on the filmy physical feature

通过研究真空蒸镀工艺中预熔→蒸发过渡电流变化率对光控膜物理特性（ 附着力和耐磨性） 的影响，得出过渡电流变化率是影响蒸镀膜层物理特性的关键因素之一，并对其机理作了讨论．实验确定出蒸镀阳光控制膜（Ｎｉ／Ｃｒ） 时过渡电流变化率不得小于３０ Ａ／ｓ．

Through the investigating of the vacuum evaporate plating process:the rate of variation of evaporate transition current influencing on the filmy physical feature, giving that the rate of variation of transition current is one of the critical factors that influence the filmy physical feature, and explain its mechanism. The experiments show that the rate of variation of transition current should not be less than 30 A/s.