摘要
本文综述了电沉积方法制备具有超导、电致变色特性的金属氧化物薄膜和具有半导体特性的金属化合物薄膜的基本方法、沉积原理、薄膜性能及存在问题，并对今后的发展进行了展望。
The new progress and related mechanism of the electrodeposition of functional metal compound (such as superconductors,electrochromism materials,semiconductors,et al),the properties of thin films and the problems have been introduced.The development trends of the preparation of functional metal compound thin films by electrodeposition are forecasted.
出处
《功能材料》
EI
CAS
CSCD
北大核心
1999年第6期585-587,597,共4页
Journal of Functional Materials
关键词
电沉积
功能性
金属化合物
薄膜
制备
electrodeposition
functional metal compound
thin film
