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Deposition of SiC thin films using pulsed sputtering of a hollow cathode

Deposition of SiC thin films using pulsed sputtering of a hollow cathode
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出处 《材料科学与工程(中英文版)》 2009年第8期1-7,共7页 Journal of Materials Science and Engineering
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参考文献23

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  • 9Soukup R. J., Ianno N. J. and Huguenin-Love J. L.. Analysis of semiconductor thin films deposited using a hollow cathode plasma torch. Solar Energy Materials and Solar Cells, 2007, 91: 1383-1387.
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