1J.Karner,M.Pedrazzini,High current d.c.arc(HCDCA)technique for diamond deposition.[J].Diamond and Related Materials,1996,5:217-220.
2John V B,John P D.Chemical vapour deposited diamond films as protective coatings on titanium alloys[J].Diamond and Related Materials,1994,3:295.
3Sato T,Hosokawa Y.Plasma carbonitriding of cemented carbide substrate as an effective pretreatment process for diamond[J].CVD Surface and Coating Technology,1999,112:189.
4Nesladek M,Vandierendonck K,Quaeyhaegens C et al.The surface properties on both sides of the diamond film[J].Thin Solid Film,1995,270:184.
5Shibuki K,Sasaki K,Yagi M et al.Wear resistant diamond coatings on alumina[J].Surf Coat Technol,1993,57:159.
6Kruger J K,et al.Hypersonic properties of nan-and microstructured CVDdiamond[J].Diamond and related Materials,2000,9:123-128.
7Simon S Proffitt,et al.Growth of nanocrystalline diamond films for low field electron emission[J].Diamond and Related Materials,1999:8 768-771.
8Yugo S,Kanai T,Kimura T,and Muto T.Generation of diamond nuclei by electric field in plasma chemical vapor deposition[J].Applied Physics Letters.1991,58(10):1036-1038.
9Khomich A V,Perov P I,et al.Influence of post-deposition annealing and oxidation on structure related materials[C].Third International Conference.Washington:NIST Technical Publication,1995,597.
10Gouzman I,et al.Nanosize diamond formation promoted by direct current glow discharge process:Synchrotron radiation and high resolution electron microscopy studies[J].Applied Physics Letters,1998,72:2517-2519.
