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两步腐蚀法制备多晶硅绒面 被引量：3

Double Treatments of Multi-crystalline Silicon Texturing
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摘要 采用两步化学腐蚀法在多晶硅材料的表面制备了绒面结构,其中两步腐蚀法包括酸-碱两步腐蚀法和酸-酸两步腐蚀法。通过表面形貌SEM和反射谱的测试,详细地研究了不同腐蚀条件和腐蚀溶液制备绒面的形貌和光学特征。实验发现,当腐蚀速率较快时,多晶硅的绒面形貌会出现大量的晶界和针孔效应,并分析了其形成原因。同时,采用酸-碱两步腐蚀法的效果优于酸-酸两步腐蚀法的效果。最后,用PECVD在绒面上沉积SiNx减反射膜,使表面的反射率在600～800nm范围内降到3%左右,达到了良好的减反射效果,得出了最优的绒面制备方案。 Multi-crystalline silicon wafers were textured by double chemical treatments,which include acid-alkali and double acid treatments.By using SEM and reflectance spectrum,detailed study of surface morphology and optical properties of different etched surfaces was carried out.The results show that a large number of grain boundary delineation and pinholes will produce when the etching rate is too fast,and the reason is also discussed.And the results of acid-alkali treatment are better than that of double acid treatment.With PECVD AR coating of silicon nitride film,the reflectivity of texturing is reduced to be about 3% in the wavelength of 600~800 nm.Excellent preparation schemes are achieved.
作者 张妹玉 陈朝
机构地区 闽江学院物理学与电子信息工程系 厦门大学物理系 厦门大学能源学院
出处 《半导体光电》 CAS CSCD 北大核心 2011年第2期243-247,共5页 Semiconductor Optoelectronics
基金 国家自然科学基金项目(61076056) 福建省重大专题项目(2007ZH0005-2) 闽江学院B类科研项目(YKY09003B)
关键词 多晶硅 绒面 光学特性 multi-crystalline silicon texturing optical properties
分类号 TM914.41 [电气工程—电力电子与电力传动]
  • 相关文献

参考文献12

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二级参考文献6

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共引文献11

同被引文献28

  • 1王立建,刘彩池,孙海知,郝秋艳.多晶硅太阳电池酸腐表面织构的研究[J].光电子．激光,2007,18(3):289-291. 被引量：8
  • 2Spiegel M, Gerhards C, Huster F, et al. Industrially attrac tive front contact formation methods for mechanically V-tex- tured multicrystalline silicon solar cell [J]. Solar Energy Mater Solar Ceils, 2002,74 ( 1 ) : 175.
  • 3Daisuke N, Hiroaki M, Shuichi H, et al. Large-size multi- crystalline silicon solar cell with honeycomb textured surface and point-contacted rear toward industrial production [J]. Solar Energy Mater Solar Cells, 2011,95 ( 1 ) : 49.
  • 4Weberl K J, Blakersl A W, Stocksl M J, et al. Thin silicon cells using novel LASE process[C]// 3rd World Conference on Photovoltaic Energy Conversion. Osaka,Jpn,2003.
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  • 6Nositschka W A, Voigt O, Manshanden P, et al. Texturi sation of multicrystalline silicon solar cells by RIE and plas- ma etching [J]. Solar Energy Mater Solar Cells, 2003,80 (2) :227.
  • 7Macdonald D H, Cuevas A, Kerr M J, et al. Texturing in- dustrial multicrystalline silicon solar cells [J]. Solar Energy Mater Solar Cells, 2004,76 (1) : 277.
  • 8Panek P, Lipinski M, Dutkiewicz J. Texturization of multi- crystalline silicon by wet chemical etching for silicon solar cells [J]. J Mater Sci,2005,40(6): 1459.
  • 9Spiegel M, Gerhards C, Huster F, et al. Industrially attractive front contact formation methods for mechanically V-textured muhic- rystalline silicon solar cells[ J]. Solar Energy Materials & Solar Cells ,2002,74 : 175 - 182.
  • 10Gerhards C, Marckmann C, Tfille R, et al. Mechanically V-textured low cost multicrystalline silicon solar cells with a novel print- ing metallization [ A ]. Proc of the 26th IEEE PVSC, 1997:43 - 46.

引证文献3

二级引证文献4

半导体光电
2011年 第2期

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