期刊文献+

正偏压对微波等离子体CVD法制备金刚石薄膜的影响 被引量:1

Effect of positive bias on the diamond coatings deposited by microwave plasma CVD method
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摘要 线形同轴耦合式微波等离子体CVD法是在硬质合金微型钻头(微钻)表面沉积金刚石涂层的最佳方法之一。本文首先研究了酸碱两步预处理后微钻表面的形貌和成分,然后研究了微钻工作表面金刚石的沉积情况,最后重点研究了正偏压对微钻不同位置金刚石生长的影响。结果表明,在微钻上施加50 V正偏压时,金刚石薄膜具有最佳的形貌和较好的均匀性。 The linear-coaxially coupled microwave plasma chemical vapor deposition(CVD) is one of the best methods to deposit diamond coatings on cemented carbide micro-drills.In this work,the morphology and composition of micro-drills after caustic and acidic pretreatment was studied.The morphology of diamond coatings on the drill working surface was also researched.More over,the effect of positive bias on diamond coating growth at different position of the drill was researched in detail.The results indicated that it could get the best diamond coatings by putting a 50 V positive bias on micro-drills.
出处 《金刚石与磨料磨具工程》 CAS 北大核心 2011年第2期22-26,共5页 Diamond & Abrasives Engineering
关键词 金刚石薄膜 酸碱两步法 微型钻头 正偏压 diamond coatings caustic and acidic pretreatment micro-drill positive bias
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参考文献14

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