弛豫铁电晶体PZNT(001)晶面的腐蚀行为

Etching Behavior on(001) Face of Relaxor Ferroelectric Crystal PZNT

采用化学腐蚀方法研究了坩埚下降法生长的PZNT93/7晶体(001)晶面的腐蚀行为。在PZNT晶体表面观察到反平行180°原生态铁电畴,在抛光样品表面观察到位错蚀坑、包裹物、机械加工划痕等缺陷形貌,并对腐蚀机理进行了探讨。化学腐蚀还揭示了微观畴的动力学变化,显示畴结构对环境变化十分敏感。

The etching behavior on（001） face of PZNT93/7 ferroelectric crystal grown by Bridgman method was investigated by chemical etching method.The antiparallel 180° domains on（001） face were observed as it was immerged in hot HNO3 solution.Dislocation etching pits,inclusions and mechanical scratches on（001） face were revealed and the etching mechanism was discussed.The domain state of PZNT93/7 crystal was sensitive to environment variation and the micro-domains were observed around the defects.