基于磁控溅射离子镀技术的不同晶态纯Cr薄膜微观组织结构研究

Study on Microstructures of Pure Cr Films with Different Crystalline Deposited by Magnetron Sputter Ion Plating

基于磁控溅射离子镀技术,制备了不同晶态结构的纯Cr薄膜,分析了电场环境对纯Cr薄膜晶态结构影响的客观规律;结合溅射原理和薄膜生长原理揭示了电场环境对纯Cr薄膜生长过程影响的内在机理;探讨了磁控溅射离子镀技术在工程材料的纳米化、非晶化进程中应有的功能,旨在为纳米材料的研发及其制备技术的创新提供参考依据。

Pure Cr films with different crystalline microstructures were deposited by magnetron sputter ion plating,and the effect of electric field environment on the crystalline structure of pure Cr films was analyzed.Combining sputtering principium with film growth principium,essential impact of electric field environment on the growth process of pure Cr films was revealed.Prospective functions of magnetron sputtering ion plating technology in the process of the nano-engineering materials and amorphous materials were discussed.It is expected to provide references for RD nano-materials and technical innovation of preparation.