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一种巯基酯类光敏胶单体的合成及其性能研究

Study on synthesis and properties of a thiol ester photosensitive adhesive monomer
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摘要 以三羟甲基丙烷(TMP)、3-巯基丙酸为主要原料,采用酯化反应法合成了一种重要的巯基酯类光敏性单体TMPMP[三羟甲基丙烷三(3-巯基丙酸酯)]。通过单因素试验法优选出合成TMPMP的最佳工艺条件,并采用红外光谱(FT-IR)法、核磁共振氢谱(1H-NMR)法和元素分析法等对TMPMP结构进行了表征。结果表明:当m(TMP)=6.71 g、m(3-巯基丙酸)=19.10 g、m(催化剂对甲苯磺酸)=0.59 g、V(携水剂甲苯)=40 mL和反应时间为1.5 h时,产物酯化率为98.6%,收率为79.6%;以TMPMP作为UV固化胶的光敏性单体,以三羟甲基丙烷三丙烯酸酯(TMPTA)为主要原料,制成的巯基/烯烃UV固化胶具有良好的固化性能及耐热性能,满足光学领域的应用要求。 With trimethylol propane (TMP),3-mercaptopropanoic acid as main materials,an important thiol ester photosensitive monomer TMPMP[trimethylolpropane tris (3-mercapto propionate)] was synthesized by esterification, The optimal process conditions of preparing TMPMP were preferred by single factor experiment,and the structure of TMPMP was characterized by infrared spectroscopy(FT-IR),LH-nuclear magnetic resonance(^1H-NMR) and element analysis method and other methods. The results showed that the esterification rate and yield of product were 98.6% and 79.6% respectively when the contents of TMP,3- mercaptopropanoic acid and p-toluenesulfonic acid as catalyst were 6.71,19.10,0.59 g respectively,toluene as water-carrying agent was 40 mL and reaction time was 1.5 h. The thiol/alkene UV curable adhesive,which had good curing properties and heat resistance,could meet the application requirements for optical field when the TMPMP was used as photosensitive monomer of UV curable adhesive,trimethylolpropane three acrylate(TMPTA) was used as main material.
出处 《中国胶粘剂》 CAS 北大核心 2011年第5期9-14,共6页 China Adhesives
基金 973计划前期研究专项基金项目(2010CB635111)
关键词 光敏性单体 紫外光固化 胶粘剂 巯基/烯烃 photosensitive monomer UV curing agent adhesive thiol/alkene
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参考文献20

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