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磁控溅射制备TiWN/MoS_2薄膜及其微观结构和摩擦学性能研究 被引量:3

Preparation of TiWN/MoS_2 Films by Magnetron Sputtering and It′s Microstructure and Tribological Properties
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摘要 采用磁控溅射方法在40Gr不锈钢基体上,沉积了TiN及TiWN单层薄膜、TiN/MoS2及Ti-WN/MoS2双层薄膜,对比分析了薄膜的成分、相结构、微观形貌及摩擦学性能。结果表明:根据W含量的不同,TiWN薄膜中,Ti0.67W0.33N膜层具有较高的硬度和弹性模量;TiWN/MoS2薄膜中,TiWN层主要含有TiN和WN相,MoS2层含有MoS2和MoO3相;与TiN/MoS2薄膜比较,TiWN/MoS2薄膜具有更优异的减摩、耐磨性能,可减小材料的磨损,延长其使用寿命。 TiWN/MoS2 multilayer coating and TiN/MoS2 coating were successfully deposited by magnetron sputtering on 40Gr steel. The film composition, phase structure, microstructure and tribological performance were compared and analyzed. The results show that for TiWN film, according to the different W content, Ti0.67W0.03N film has higher hardness and elastic modulus; For TiWN/MoS2 film, TiWN layer mainly contains TiN and WN phase, MoS2 layer con-tains MoS2 and MoO3 phase; Compared TiN/MoS2 film, TiWN/MoS2 film has more excellent friction reduction, wear resistance, can reduce the wear and prolong its service life.
出处 《表面技术》 EI CAS CSCD 北大核心 2011年第3期48-51,56,共5页 Surface Technology
关键词 TiWN/MoS2涂层 磁控溅射 微观结构 摩擦磨损性能 TiWN/MoS2 coating reactive magnetron sputtering microstructure friction and wear behavior
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共引文献23

同被引文献40

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