溅射ZnO薄膜的显微结构

Microstructures of ZnO Thin Films Sputtered

本文用X射线衍射、扫描电子显微镜、透射电子显微镜、反射高能电子衍射等方法,测定了平面直流磁控反应高速率溅射 ZnO 薄膜的显微结构。实验观察到三种不同的表面结构:6mm 对称结构、非晶态以及非6mm 对称结构。衬底材料对 ZnO 薄膜 c 轴取向具有很大影响。ZnO 在玻璃衬底上为[0001]取向,在金膜上为[0001]取向。薄膜柱状结构横向为单一晶粒。纵向由于应力的存在为多晶结构。晶粒之间晶界层不到1nm 量级。相交晶粒 c 轴取向基本一致,a、b 轴取向不同。

ZnO thin films deposited on glass and gold film substrates have been obtaindby the reactive D.C.planar magnetron sputtering technique.The microstructures ofthe films have been evaluated by XRD,SEM,TEM,and RHEED.The surface mi-crostructures of the films could possess three crystalline states i.e.the wurtzitetype,non-wurtzite type and amorphous.The polarity of c-axis may be affected bythe substrates.Positive c-axis ZnO films can be formed on the gold film substrateand negative c-axis films on the glass.The ZnO film sputtered forms a columnarstructure.In the columnar structure,there is only one grain at the direction parallelto the substrate,and there are many grains at the direction vertical to the substrate,for internal stress existing.