摘要
本文用X射线衍射、扫描电子显微镜、透射电子显微镜、反射高能电子衍射等方法,测定了平面直流磁控反应高速率溅射 ZnO 薄膜的显微结构。实验观察到三种不同的表面结构:6mm 对称结构、非晶态以及非6mm 对称结构。衬底材料对 ZnO 薄膜 c 轴取向具有很大影响。ZnO 在玻璃衬底上为[0001]取向,在金膜上为[0001]取向。薄膜柱状结构横向为单一晶粒。纵向由于应力的存在为多晶结构。晶粒之间晶界层不到1nm 量级。相交晶粒 c 轴取向基本一致,a、b 轴取向不同。
ZnO thin films deposited on glass and gold film substrates have been obtaindby the reactive D.C.planar magnetron sputtering technique.The microstructures ofthe films have been evaluated by XRD,SEM,TEM,and RHEED.The surface mi-crostructures of the films could possess three crystalline states i.e.the wurtzitetype,non-wurtzite type and amorphous.The polarity of c-axis may be affected bythe substrates.Positive c-axis ZnO films can be formed on the gold film substrateand negative c-axis films on the glass.The ZnO film sputtered forms a columnarstructure.In the columnar structure,there is only one grain at the direction parallelto the substrate,and there are many grains at the direction vertical to the substrate,for internal stress existing.
出处
《无机材料学报》
SCIE
EI
CAS
CSCD
北大核心
1990年第1期43-48,共6页
Journal of Inorganic Materials
基金
国家自然科学基金5860366
关键词
氧化锌
薄膜
溅射沉积
显微结构
ZnO thin film
Sputtering deposition
Microstructure
Microtexture