摘要
本文系统地研究了离子束强化高频离子镀TiN的工艺参数。为了比较其效果,相应地进行了高频离子镀、离子束强化蒸镀工艺实验。测量了上述三种方法镀膜的物理性能、分析了组织结构。离子束强化不仅提高了沉积速率,而且有明显的细化晶粒、择优取向的作用。本研究所得结果对提高 TiN 沉积速率、膜质量都有实用意义。
In this paper,technical parameters of ion beam assist R.F.ion plating TiN films were studied systematically.In order to compare the effect of different depo-sition methods on properties of the films,technical experiments of the R.F.platingand ion beam assist deposition were made.The physical properties of the films pla-ted by the methods mentioned above were measured and their structures were anal-yzed.The ion beam assist effect not only increases deposition rate but also inf-luences the grain size and prefered orientation.The results of the study have apractical significance in improving the quality of TiN films and increasing the de-position rate.
出处
《无机材料学报》
SCIE
EI
CAS
CSCD
北大核心
1990年第3期265-271,共7页
Journal of Inorganic Materials
关键词
离子镀膜
氮化钛
薄膜
Ion beam assist
R.F.ion plating
Ion beam assist deposition
Ion beam assist R.F.ion plating
TiN film