期刊文献+

Effects of annealing temperature on the microstructure and hardness of TiAlSiN hard coatings 被引量:12

Effects of annealing temperature on the microstructure and hardness of TiAlSiN hard coatings
原文传递
导出
摘要 TiAlSiN hard coatings were synthesized on high-speed steel using an arc ion enhanced magnetic sputtering hybrid system.The microstructure and hardness of the coatings at different annealing temperatures were explored by means of XRD,TEM,EDAX and Vickers indentation.The as-deposited TiAlSiN coatings were confirmed to be amorphous due to high depositing rate and low deposition temperature during the film growth.The transformation from amorphous to nanocomposites of nano-crystallites and amorphousness were observed after the annealing treatment,the microstructure of TiAlSiN coatings annealed at 800°C and 1000°C were consisted of crystalline hcp-AlN,fcc-TiN and amorphous phase,however,the coatings were only consisted of fcc-TiN and amorphous phase when annealing at 1100°C and 1200°C.Meanwhile,the formation of Al2O3 was detected on the coating surface after annealing at 1200°C and it indicated the excellent oxidation resistance of the TiAlSiN coatings under the present experimental conditions.Furthermore,the average grain size of the TiAlSiN coatings after high temperature annealing even at 1200°C was less than 30 nm and the size increased with the increasing temperature.However,the hardness of the so-deposited coatings with HV0.2N=3300 dramatically decreased with the increase of temperature and reached nearly to the hardness of TiN coatings with HV0.2N=2300. TiAlSiN hard coatings were synthesized on high-speed steel using an arc ion enhanced magnetic sputtering hybrid system. The microstructure and hardness of the coatings at different annealing temperatures were explored by means of XRD, TEM, EDAX and Vickers indentation. The as-deposited TiAlSiN coatings were confirmed to he amorphous due to high depositing rate and low deposition temperature during the film growth. The transformation from amorphous to nanocomposites of nano-crystallites and amorphousness were observed after the annealing treatment, the microstructure of TiAlSiN coatings annealed at 800℃and 1000℃ were consisted of crystalline hcp-AlN, fcc-TiN and amorphous phase, however, the coatings were only consisted of fcc-TiN and amorphous phase when annealing at 1100℃ and 1200℃. Meanwhile, the formation of Al2O3 was detected on the coating surface after annealing at 1200℃ and it indicated the excellent oxidation resistance of the TiAlSiN coatings under the present experimental conditions. Furthermore, the average grain size of the TiAlSiN coatings after high temperature annealing even at 1200℃was less than 30 nm and the size increased with the increasing temperature. However, the hardness of the so-deposited coatings with HV0.2N=3300 dramatically decreased with the increase of temperature and reached nearly to the hardness of TiN coatings with HV0.2N=2300.
出处 《Chinese Science Bulletin》 SCIE EI CAS 2011年第16期1727-1731,共5页
基金 supported by the National Natural Science Foundation of China (50671079, 50531060) National Basic Research Program of China (2004CB619302) Program for New Century Excellent Talents in University of China (NCET-04-0934)
关键词 退火温度 硬质涂层 微观结构 硬度 TIN涂层 混合动力系统 沉积温度 纳米复合材料 arc ion enhanced magnetic sputtering, annealing treatment, microstructure, hardness, TiAISiN hard coatings
  • 相关文献

参考文献28

  • 1Senna L F, Achete C A, Freire F L. Structural, chemical, mechanical and corrosion resistance characterization of TiCN coatings prepared by magnetron sputtering. Surf Coat Technol, 1997, 94-95:390-397.
  • 2Musil J, Zemek J, Regent F, et al. Composition, structure, micro- hardness and residual stress of W-Ti-N films deposited by reactive magnetron sputtering. Thin Solid Films, 2002, 408:136-147.
  • 3Polakova H, Musil J, Mitterer C, et al. Structure-hardness relations in sputtered Ti-Al-V-N films. Thin Solid Films, 2003, 444:189-193.
  • 4Karvankova P, Veprek-Heijiman M G J, Veprek S, et al. Superhard nc-TiN/a-BN and nc-TiN/a-TiBx/a-BN coatings prepared by plasma CVD and PVD: A comparative study of their properties. Surf Coat Technol, 2003, 163-164:149-156.
  • 5Diserens M, Patscheidera J, Levy F. Mechanical properties and oxi- dation resistance of nanocomposite TiN-SiNg physical-vapor-depo- sited thin films. Surf Coat Technol, 1999, 120-121:158-165.
  • 6Musil J, Hruby H. Superhard nanocomposite Ti1-xAlxN films prepared by magnetron sputtering. Thin Solid Films, 2000, 104-109:365-369.
  • 7Lugscheider E, Knotek O, Loftier F. Deposition of arc TiAlN coat- ings with pulsed bias. Surf Coat Technol, 1995, 76-77:700-706.
  • 8Kim Ch W, Kim K H. Anti-oxidation properties of TiAIN films pre- pared by plasma-assisted chemical vapor deposition and roles of Al. Thin Solid Films, 1997, 307:113-119.
  • 9Rebouta L, Tavares C J, Aimo R, et al. Hard nanocomposite Ti--Si-N coatings prepared by DC reactive magnetron sputtering. Surf Coat Technol, 2000, 133-134:234-239.
  • 10Vaz F, Rebouta L, Alves E, et al. Characterization of Ti1-xSixNy nanocomposite films. Surf Coat Technol, 2000, 133-134:307-313.

同被引文献81

引证文献12

二级引证文献66

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部