摘要
对磁介质辅助抛光技术２０ 年来的发展作了简要的回顾，进而介绍了磁流变抛光技术的产生和发展背景、抛光机理及微观解释、数学模型，同时提出了这种抛光技术的关键所在，并对其发展未来进行了展望。
The developing of magnetic media assisted finishing technology in the last 20 years is reviewed in this paper. Producing, developing, mechanism and micromechanism and mathematical model of magnetorheological finishing are described in detail. The key technology and the future of finishing are also given in the paper.
出处
《光学精密工程》
EI
CAS
CSCD
1999年第5期1-8,共8页
Optics and Precision Engineering
基金
国家自然科学基金
关键词
磁介质辅助抛光
磁流变抛光
磁流变抛光液
抛光
Magnetic media assisted finishing,Magnetorheological finishing,Magnetorheological polishing fluid,Convex ribbon,Polishing spot
