摘要
应用光刻和薄膜沉积技术,制作了多级衍射光学元件。对制作误差和影响误差的因素进行了分析。给出了改善对准误差的标校方法,并在实际的多级衍射光学元件制作过程中得到验证。
Photolithographic patterning and thin film deposition were used for manufacturing multilevel diffractive optical element(DOE). Fabrication errors and its affecting factors were analyzed for multilevel DOE in this paper. Calibration method was come up with to modify alignment error. It was proved by actual manufacturing process that this method is available for aligning positioning error.
出处
《光学精密工程》
EI
CAS
CSCD
1999年第5期67-72,共6页
Optics and Precision Engineering