摘要
采用磁控溅射(DMS)和能量过滤磁控溅射(EFDMS)技术在玻璃衬底上制备ITO透明导电薄膜。利用扫描电子显微镜、原子力显微镜、X射线衍射、紫外-可见分光光度计、四探针电阻仪、椭偏光谱仪等对薄膜的性能进行表征和分析,初步探讨了EFDMS技术的成膜机理。研究发现与DMS技术相比,EFDMS技术可有效降低薄膜的表面粗糙度,并且薄膜光电性能有一定改善。
The indium-tin-oxide（ITO） films were grown by DC magnetron sputtering and by energy filtered DC magnetron sputtering on glass substrates,respectively.The impacts of the growth conditions on the quality of the ITO films were studied.Its microstructures and properties were characterized with X-ray diffraction,scanning electron microscopy,atomic force microscopy,ultra violet visible light spectroscopy,ellipsometry,and conventional probes.The results show that the energy filtered DC sputtering considerably improves the film quality.For instance,the energy filtered DC magnetron sputtering outperforms the DC magnetron sputtering in growing smooth ITO films with low sheet resistance and good optical properties.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2011年第3期278-282,共5页
Chinese Journal of Vacuum Science and Technology
基金
国家自然科学基金资助项目(No.61076041)
关键词
ITO薄膜
光电性能
表面粗糙度
磁控溅射
能量过滤磁控溅射
ITO film
Photoelectric properties
Surface roughness
DC magnetron sputtering
Energy filtered DC magnetron sputtering
