脉冲电沉积机理、动力学分析及其验证

Analysis of Mechanism and Dynamics for Pulse Electrodeposition and Its Verification

系统地论述了脉冲电沉积的机理及其动力学原理。根据脉冲电沉积的特点,将导通时间Ton分为形核沉积(+Ton/2)过程与晶粒长大(-Ton/2)过程,并进行了动力学分析。分析并经试验证明:Ton/Toff必须在一定的范围内协调成比例,脉冲导通时间Ton太大,容易造成浓差极化,导致晶粒的长大;脉冲关断时间Toff太大,造成非沉积时间过长,降低沉积效率;Ton和Toff越小,越有利于沉积层晶粒的细化,为一种新型的材料制造方法———脉冲电沉积提供了理论指导。

The mechanism and dynamics principle of pulse electrodeposition were systematically described.According to the feature of pulse electrodeposition,pulse-on time(Ton) was classified into nucleation process and growth process of grains.The two processes were analyzed based on dynamics.Results show that the Ton and pulse-off time(Toff) must be coordinated proportionally in appropriate range.Too long Ton led to concentration polarization and growth of grains;while too long Toff led to extended non-deposition duration and lowered deposition efficiency.Besides,short Ton and Toff were beneficial to the refining of grains.Relevant research results were helpful to theoretical guidance of pulse electrodeposition.