金属螯合物印迹聚邻苯二胺膜的电化学合成及表征

Electrosynthesis and Characterization of Metal Chelate Imprinted Poly-o-Phenylenediamine Films

以邻苯二胺(o-PD)为功能单体,乙二胺四乙酸铜离子螯合物(Cu(II)-EDTA)为模板分子,利用循环伏安法(CV)合成了Cu(II)-EDTA分子印迹聚合物(MIPs).通过紫外-可见(UV-Vis)光谱、X射线光电子能谱(XPS)、差分脉冲伏安法(DPV)、石英晶体微天平(QCM)等手段对合成的聚合物进行了表征.UV-Vis光谱分析表明当溶液的pH≥5.0时有利于邻苯二胺电聚合形成聚合度较高的聚合物;XPS结果证明Cu(II)-EDTA螯合物被成功地包覆在聚合物膜中,且推断出模板分子和聚合物之间可能主要靠氢键相互作用;DPV实验结果证明模板分子能够被有效洗脱;QCM的测试结果表明此方法合成的Cu(II)-EDTA印迹聚合物膜对Cu(II)-EDTA具有良好的响应度.

Novel molecularly imprinted polymers （MIPs） were synthesized by the electrochemical polymerization of o-phenylenediamine （o-PD） using cyclic voltammetry in the presence of Cu（II）- ethylenediaminetetraacetate chelate （Cu（II）-EDTA）, which acted as a template. The resultant polymers were characterized by UV-Vis spectroscopy, X-ray photoelectron spectroscopy （XPS）, differential pulse voltammetry （DPV）, and quartz crystal microbalance （QCM）. UV-Vis spectral analysis indicated that a higher degree poly-o-phenylenediamine （PoPD） was obtained at pH≥5.0. XPS analysis clearly showed the successful embedding of a Cu（II）-EDTA chelate in the PoPD film and, therefore, hydrogen bonding was a major interaction between the template and the PoPD film. DPV analysis confirmed the successful removal of the template from the PoPD film. The QCM test showed that the Cu（II）-EDTA imprinted PoPD film had good Cu（II）-EDTA chelate sensitivity.