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CLAM钢表面硬质薄膜的制备与性能研究

Preparation of hard films on the CLAM steel and their properties
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摘要 采用射频反应磁控溅射法在中国低活化马氏体(CLAM)不锈钢表面制备了单层A12O3、SiC、W薄膜以及SiC/A12O3、W/A12O3双层膜。对所制备的薄膜进行了XRD结构分析、AFM表面形貌测试和显微硬度测试。结果表明:单层SiC薄膜表面出现了部分脱落,而SiC/A12O3双层膜表面完整光滑。W/A12O3双层薄膜表面平整光滑,均方根粗糙度为4.28 nm。W单层薄膜和W/A12O3双层薄膜经氩气中800℃退火2 h后硬度最高,分别达到了34.4 GPa和31.3 GPa。 A12O3,SiC,W thin films and SiC/A12O3,W/A12O3 bilayer films were prepared by reactive radio-frequency(RF) magnetron sputtering on China low activation martensitic(CLAM) steel.The phase composition,surface morphology and micro hardness of the films were detected by X ray diffractometer(XRD),atomic force microscopy(AFM) and micro hardness meter.The results showed that,the SiC thin film peeled off to some extent,while the SiC/A12O3 bilayer films are very tight and smooth.The W/A12O3 bilayer films are also very smooth whose root-mean-square roughness is 4.28nm.W thin film and W/A12O3 bilayer films have the highest hardness after annealed for 2h in Ar atmosphere at 800℃,which are 34.4GPa and 31.3GPa respectively.
出处 《真空》 CAS 北大核心 2011年第3期67-71,共5页 Vacuum
基金 国家"973"项目(2008CB717802) 安徽省自然科学基金(090414182) 安徽省高校自然科学基金(KJ2009A091)
关键词 射频反应磁控溅射 CLAM钢 A12O3薄膜 SIC薄膜 W薄膜 SiC/A12O3双层膜 W/A12O3双层膜 显微硬度 reactive RF magnetron sputtering CLAM steel A12O3 thin film SiC thin film W thin film SiC/A12O3 bilayer film W/A12O3 bilayer film micro hardness
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