摘要
用于离子束辅助轰击镀膜的考夫曼型变孔径球面栅离子源，由于缩小了体积，散热条件不好，离子源启动后温度迅速上升，陶瓷绝缘子的绝缘强度迅速降低，永久磁铁的磁场强度也下降，致使离子源的连续有效工作时间不足半小时。采用多处屏蔽后，延长了陶瓷绝缘子和磁棒处于较低工作温度的时间，使离子源的连续有效工作时间达到了一小时，基本满足了辅助轰击镀膜的要求。
Because of minifying of cubage, degenerating of heat radiation, increasing of body temperature, decreasing of the isolation intensity of chinaware and decreasing of the magnetic field intensity of permanent magnet, the valuable work time of varietal aperture spherical surface grid Kaufman Ion Source decreased into no more than 0.5 hour. By way of using heat shields, the chinaware and the permanent magnet can work at a relatively low temperature. The valuable work time of the Kaufman Ion Source can reach more than l hour,and satisfied the normal requirement to assist films deposition.
出处
《光学仪器》
1999年第4期44-46,共3页
Optical Instruments
关键词
离子源
稳定性
热屏蔽
镀膜
Ion Sources, Stability, Heat Isolating.
