用IAD法制作的高密集型分波复合器滤光片的特性(英文)

Fabrication and Characteristics of DWDM Filters Deposited by IAD

随着高密集型分波复合器需要的不断增加，在光纤通讯领域中，光学薄膜滤光片已经成为了一个很关键的光学元件。在高密集分波复合器中，我们用ＩＡＤ方法制作了低损失、高稳定性的超窄带滤光片并在本文加以讨论。在湿度环境试验中，这种高堆积密度的光学薄膜显示了没有任何波漂。在温度环境试验中，它的热稳定性为０．００１２ｎｍ ／℃。在使用Ｔａ２Ｏ５／ＳｉＯ２，用于１００ＧＨｚ的滤色片的场合下，窄带滤色片的插入损失为０．３４ｄＢ。在使用Ｎｂ２Ｏ５／ＳｉＯ２，用于２００ＧＨ２ 的滤色片的场合下，插入损失为０．１７ｄＢ，两者都显示了极好的分光光谱特性，甚至半宽为０．６６ｎｍ 的情况下，它们的截面ＳＥＭ 微结构显示了非晶结构，平坦的表面与界面。

With the rapid increase in DWDM(Dense Wavelength Division Multiplexing)demand,dielectric thin film filters have increasingly become a key component for optical telecommunications.An ultranarrow bandpass filter deposited by IAD for use in DWDM applications which has improved insertion loss and environmental stability is recently manufactured and discussed in the following.The high packing density of coating results in nearly zero wavelength shift to resistant to altering the humidity environment,and shows temperature stability in 0.0012 nm/℃.The filter also has very low absorption and scattering and improves the filter insertion loss for 100GHz down to 0.34 dB in case of Ta 2O 5/SiO 2 system and for 200 GHz down to 0.17 dB in case of Nb 2O 5/SiO 2 system.Experimental data are presented describing the spectral performance and humidity and temperature stability of multiple cavity filters with FWHM of 6.6 angstroms.The cross sectional morphologies taken by SEM show an amorphous morphology,and smooth surfaces and interfaces between the layers.