改进基板修饰方法制备有机/无机分子沉积膜

Preparation of Organic/Inorganic Molecular Deposition Films by Improved Substrate Modification Process

把硅烷偶联剂［（ＣＨ３Ｏ）３Ｓｉ（ＣＨ２）３ＳＨ］ 直接组装在石英基板上，随后将有机膜的端巯基（ＳＨ）原位氧化为磺酸基（ＳＯ３Ｈ），再利用其负电性表面交替沉积上双季铵盐和ＷＯ３（ｅ－ ），制得多层有机／无机分子沉积膜．经紫外可见光谱及小角Ｘ射线衍射表征。

The silocane coupling reagents [(CH 3O) 3Si(CH 2) 3SH] was assembled onto the hydroxylated surface of quartz, then the terminal-SH groups at the exposed surface were oxidized into sulfonic acid groups. The multilayer organic/inorganic molecular deposition films were obtained through repeating the depositional procedure using the bipolar quaternary ammonium salt and WO 3. Characterization using UV-visible absorption spectra and LAXD shows that the films have excellent ultrathin and ordered layer structure.