氢化锆在高温水蒸气中的氧化行为

Oxidation Behaviors of Zirconium Hydride in High-temperature Water Vapor Atmosphere

通过恒温恒压氧化实验研究了氢化锆在300－700℃高温水蒸气中的氧化行为。结果表明，氢化锆的质量增重随着氧化温度的升高而增大。在氧化过程进行15h以后，OH-／O在氧化膜中的内扩散成为氧化反应的控速步骤。水蒸气中的H抑制了氢化锆在高温氧化条件下的氢损失。氧化膜主要由单斜相M-ZK）2组成，氧化膜的最外层由四方相T-ZrO2和立方相C-ZrO2组成。

Oxidation behaviors of zirconium hydride in water vapor atmosphere at 300-700℃ were investigated by isothermal oxidation. The mass of the oxide film increased with temperature increasing. The internal diffusion of OH /O in the oxide film controlled the oxidation process after 15h. The existence of H in water vapor restrained the hydrogen loss of the zirconium hydride during the oxidation. The main phase of the oxide film was monoclinic ZrO2 （M-ZrO2）. A little tetragonal ZrO2 （T-ZrO2） and cubic ZrOz （C-ZrO2） were also detected in the oxide film, especially in the outermost layer of the oxide film.